http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010017136-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45557 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4482 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 1999-08-09^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2379c0bed06ce9f894c1362e3dc73b8f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0cbc2a076da0b4c22d0f9da4b6f9658b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e50bda94058130f630cae0e0f7f0e08f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f6ecbfe117b7ab7f368b06c0be3f089 |
| publicationDate | 2001-03-05^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010017136-A |
| titleOfInvention | Bubbler for organic metal chemical vapor deposition |
| abstract | Object: The present invention provides an ultrapure water bubbler device for organometallic chemical vapor deposition.n n n Composition: The bubbler device of the present invention is a bubbler for bubbling an electrode source input through a source line to supply the bubbled source into the chamber to form an electrode of a semiconductor device, located in front of the bubbler to inert gas A first conveying gas supply for conveying the source in the bubbler, a second conveying gas supply positioned behind the bubbler and delivering the source in the bubbler using an inert gas and a vapor pressure generated within the bubbler Between the first check valve and the bubbler and the second conveying gas supply formed between the first conveying gas supply and the bubbler to prevent the source from flowing back into the input port of the bubbler by the pressure difference between the pressure in the source line and the source line. It consists of a backflow prevention part formed by the 2nd check valve formed. |
| priorityDate | 1999-08-09^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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