http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030011762-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-305 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-073 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-34 |
| filingDate | 2000-07-06^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2003-02-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20030011762-A |
| titleOfInvention | Diamond supported photocathodes for electron sources |
| abstract | As an electron beam source, a photocathode has a photoelectron emitter and a substrate made of diamond which is light transmissive. Photocathodes having a single emission region provide a single electron beam, and photocathodes having multiple emission regions provide multiple electron beams. A photoelectron emitter is arranged on the side of the diamond substrate opposite the surface on which light is incident, which has a dimming area and an emitting area opposite the dimming area where it is in contact with the light transmissive diamond, which area is defined by the dimming path. . The diamond substrate at the border of the illuminated area / emission area conducts heat away from the focused area on the photocathode. Optionally, when other materials are used as the substrate for providing the structural support, the diamond film is used for thermal conduction. The thermal conductivity of diamond is at least three orders of magnitude greater than that of fused silica, which is an optional substrate material for the photocathode. This provides effective heat conduction emission from the boundary of the dimming area / emission area, making it possible to obtain a larger current from the photocathode. This also allows for higher productivity in applications involving electron beam lithography. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160095094-A |
| priorityDate | 1999-07-29^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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