| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45568
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2002-06-24^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2004-03-10^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20040021617-A |
| titleOfInvention |
Electrode member for plasma treating apparatus, flasma treating apparatus and plasma treating method |
| abstract |
In the plasma processing apparatus, an electrode member for a plasma processing apparatus in which a ceramic porous material having a three-dimensional mesh structure in which a frame portion formed of ceramic containing alumina is continuously provided like a three-dimensional mesh is attached to the front surface of the gas supply port of the plasma generating electrode. Used as a material, the gas for plasma generation proceeds through irregularly formed holes in the three-dimensional network. As a result, the distribution of the gas to be supplied is uniform so that abnormal discharge can be prevented and can be etched uniformly without deviation. |
| priorityDate |
2001-06-25^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |