http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040043106-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-09-24^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-05-22^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040043106-A |
| titleOfInvention | Chemical-amplification-type positive radiation-sensitive resin composition |
| abstract | In the chemically amplified positive radiation-sensitive resin composition having high sensitivity and high resolution, which is composed of an alkali insoluble or alkali poorly soluble resin protected by an acid dissociable protecting group and a compound which generates an acid by irradiation, In order to reduce the difference in the resolution line width in the dense pattern of the resist in the circuit pattern in which the wheat pattern is mixed, the acid dissociable protecting group is used as an alkali insoluble or alkali poorly soluble resin protected with an acid dissociable protecting group. A compound which generates an acid by irradiation with a resin having an activation energy (ΔE) of 25 Kcal / mol or more for dissociation, and a compound which generates carboxylic acid by irradiation with a compound that generates sulfonic acid by irradiation Use a mixture. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100833839-B1 |
| priorityDate | 2001-09-28^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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