| abstract |
Disclosed are a silicone-based high-branching polymer surfactant capable of easily removing photoresist residues, a preparation method thereof, and a rinse method using a rinse solution including the same. Silicone-based high branched polymer surfactants are prepared by polymerizing monomers of the following formula (1) and include hydrophobic and hydrophilic groups.n n n n n n n n At this time, in Formula (1), R 1 is a vinyl group, R 2 means a hydrogen group. Thus, by preparing and providing a silicone-based high-branching polymer surfactant having hydrophilicity and hydrophobicity, the photoresist residue remaining in the rinse solution for semiconductor devices is easily removed. |