http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040111221-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate | 2004-11-06^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11afba3cb21b2f665bb1b91dad62e33d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_77105c72905466e2e6eb9436ecb7601d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_178e94dab545bde591bc54583473f4c2 |
| publicationDate | 2004-12-31^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040111221-A |
| titleOfInvention | Undercoating composition for photolithographic resist |
| abstract | In the present invention, an anti-reflective undercoat layer is formed between a substrate surface and a patterned photoresist layer for the purpose of preventing adverse effects of light reflected from the substrate surface on the cross-sectional shape of the patterned resist layer in a semiconductor device manufacturing process. A novel undercoating solution is disclosed. The undercoat composition for photolithography resist of the present invention is a uniform solution,n n n (A1) the following general formula:n n n n n n n n (Wherein R is a hydrogen atom or a monovalent hydrocarbon group, at least two of R 1 , R 2 , R 3 and R 4 are each a hydroxyalkyl group or an alkoxyalkyl group and the remainder are each hydrogen atoms if any) Benzoguanamine compounds or oligomers thereof;n n n (B) an organic or inorganic acid in which the acid residue contains at least one sulfur atom; Andn n n (C) It is characterized by consisting of an organic solvent. |
| priorityDate | 1999-01-28^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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