Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bf66f4f1b440d4f20f874e1514224e4d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2103-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K2101-40 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-1224 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-301 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B28D5-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-40 |
filingDate |
2003-08-06^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f5b73304bab31406c60c985752703cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07662e0e4e18555a21fa4a90ddd9e237 |
publicationDate |
2005-04-08^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20050033072-A |
titleOfInvention |
Laser machining |
abstract |
The silicon substrate W is processed by a UV or green laser beam 6 in a cooled liquid halogenated environment. Local heating of the liquid halogenated compound by the laser beam in the vicinity of the processing position causes a chemical reaction between the silicon substrate and the liquid halogenated compound to promote the processing, improve the processing quality and reduce the generation of debris by laser processing. |
priorityDate |
2002-08-06^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |