http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050115105-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32
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filingDate 2004-06-03^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_042940405908a9f749c0472ec841612c
publicationDate 2005-12-07^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20050115105-A
titleOfInvention Plasma etching apparatus and method of fabricating photomask using the same
abstract A plasma etching apparatus and a method of manufacturing a photomask using the apparatus are provided. The apparatus includes a scan type stage on which a photo mask is mounted, a plasma generator that generates a plasma at a predetermined interval from a surface of the photo mask, a control device connected to the plasma generator to control a physical state of the plasma, and a physical state of the plasma. And a storage device for storing control data. At this time, the control device controls the plasma generator to generate a plasma having a different physical state according to the position. Accordingly, it is possible to apply different etching conditions depending on the position in the photo mask, thereby minimizing the etching nonuniformity according to the position.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9034141-B2
priorityDate 2004-06-03^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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