http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20060110927-A

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filingDate 2005-04-20^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2006-10-26^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20060110927-A
titleOfInvention Manufacturing method of liquid crystal display device having low resistance wiring
abstract Unlike the conventional method, which used as a heat treatment process for the copper alloy wiring in the insulating film deposition process, the present invention performs a separate heat treatment process for the copper alloy wiring before the insulating film deposition process to forcibly oxidize the dopant (metal) surface of the copper alloy wiring A method of manufacturing a liquid crystal display device for inducing a forced diffusion of a dopant to a side, comprising: depositing a copper alloy on a substrate, forming a copper alloy wiring by patterning the copper alloy, and the copper alloy wiring It characterized in that it comprises a step of performing a heat treatment to increase the purity of the copper alloy wiring.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140089176-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9627548-B2
priorityDate 2005-04-20^^<http://www.w3.org/2001/XMLSchema#date>
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