| abstract |
The present invention provides a cleaning system for use in cleaning or cleaning a soiled substrate or substrates,n n n A washing zone (a) for contacting the contaminated substrate with the cleaning liquid to clean itn n n Source (b) for providing hot or cold feed water to the washing zone,n n n (C) a wash liquor purification and recirculation zone in fluid communication with the wash zone;n n n Effluent storage and / or discharge zone (d),n n n Optionallyn n n Product distribution zone (e),n n n Means (f) for sonicating or sonicating the contaminated substrate in the washing zone or washing pretreatment zone,n n n Electrolysis zone (g) for electrolysis of feed water or wash liquor,n n n Washing liquid sterilization zone (h) andn n n At least one of the feed water softening zones (i),n n n The wash liquor purification and recirculation zones have a cutoff in the range of about 1000 Daltons to about 1 μm, preferably about 0.05 μm to about 0.5 μm, and the lumen size is about 1 to about 10 mm, preferably about 2 to about 6 mm, more Preferably an ultrafiltration or microfiltration device having a clean water flow rate of about 3 to about 5 mm and a clean water flow rate of at least about 1000 L / m 2 .h (RO water at 25 ° C.) at 100 kPa, preferably at least about 10,000 L / m 2 .h at 100 kPa. It includes. |