http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20070031243-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-45031 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6704 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B19-41815 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67276 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67742 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2006-09-13^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-03-19^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20070031243-A |
| titleOfInvention | Processing apparatus and processing method of substrate subjected to exposure treatment |
| abstract | The substrate subjected to the exposure treatment by the exposure apparatus is transferred to the cleaning treatment apparatus of the substrate treatment apparatus. In order to provide a certain time interval between the completion of the exposure treatment and the completion of the cleaning treatment, the completion time of the cleaning treatment is controlled by adjusting the presence time (more detail, waiting time or cleaning time) of the exposed substrate in the cleaning treatment apparatus. Adjust This adjustment provides a constant time interval between the completion of the exposure treatment and the start of the post-exposure bake treatment, and likewise provides a constant time interval between the completion of the wash treatment and the start of the post-exposure bake treatment. This further improves the linewidth uniformity of the pattern formed when a chemically amplified resist is used.n n n n Substrate treatment device, substrate treatment method, exposure treatment, time interval control, line width, line width uniformity, exposure treatment, bake treatment |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100882474-B1 |
| priorityDate | 2005-09-14^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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