http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080072037-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_32faff8392335d89bdad5aeccfa9070b |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3438 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3405 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-354 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3444 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-564 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3438 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3408 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 |
| filingDate | 2006-11-06^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_573c56758771509b57563f2c74f27cc0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccf18613d3438aea123a5becde47ebe5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acc7ea0141917eeb05c304fa6fa04008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79c74dbe930069ac1a25590a74289c5c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3df0db4082d19a25d9a8c2748d2cd379 |
| publicationDate | 2008-08-05^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20080072037-A |
| titleOfInvention | Redundant anode sputtering method and assembly |
| abstract | The present invention relates to a method for coating a substrate having a cathode formed of a magnetron and to an assembly for coating a substrate having a vacuum chamber, a magnetron-cathode, two electrodes and a voltage source. Positive potentials (anode potentials) or negative potentials are alternately supplied to the electrodes. The problem of the present invention is to improve the quality of the substrate coating by increasing the uniformity of the layer thickness and by reducing the contamination of the substrate caused by the redundant anode. The problem of the present invention related to the method is solved by the fact that the negative potential is generated at the same level as the maximum of the cathode potential. This avoids the situation where the electrode to be cleaned is more eroded than if it was coated in a preceding half wave. The object of the invention with respect to the assembly is that the magnetron-cathode and the electrode are connected to the voltage source via a switching element without galvanic, ie negative and positive voltages from the voltage source can be applied alternately to the electrodes. And the connection of the magnetron-cathode and the electrode is made such that the levels of the negative voltage and the positive voltage are at the same as the level of the cathode voltage. |
| priorityDate | 2005-11-04^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID1969 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635 |
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