| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6f932d94618d9b875e401457b33e9761 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2007-07-27^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_678a21a699db512946e8475d58ebc6f5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49f9ffe1f2b7ccc194eee5ee05e2c2a1 |
| publicationDate |
2009-02-02^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20090011664-A |
| titleOfInvention |
Chemically Amplified Positive Resist Composition and Resist Pattern Forming Method Using The Same |
| abstract |
The present invention (A) a mixture of a resin having a repeating unit represented by the formula (1) and formula (2); (B) photoacid generator; And (C) an organic solvent containing a chemically amplified positive photoresist composition. The photoresist composition is excellent in resolution and pattern shape even in the case of high sensitivity, and is characterized in that the fine pattern is precisely implemented.n n n <Formula 1>n n n n n n n n <Formula 2> |
| priorityDate |
2007-07-27^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |