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filingDate 2008-07-23^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b632a73e3199261d3ba87beb455188c4
publicationDate 2009-02-02^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20090012110-A
titleOfInvention Suitable salts for acid generators and chemically amplified positive resist compositions containing them
abstract The present invention provides salts of formula (1).n n n Formula 1n n n n n n n n In Formula 1, Q 1 and Q 2 are each independently a fluorine atom or a C1-C6 perfluoroalkyl group, T is a methylene group or a carbonyl group, R is a C1-C4 alkyl group, a C1-C4 alkoxy group Is an adamantyl group substituted with one or more substituents selected from the group consisting of a hydroxyl group, a hydroxymethyl group, a cyano group and an oxo group, and A + is an organic counter ion.n n n The present invention further provides a chemically amplified resist composition comprising the salts of Formula 1 mentioned above.
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priorityDate 2007-07-25^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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