| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2998-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2003-247
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F2003-241
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-12014 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22C1-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F3-1017 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F3-10 |
| filingDate |
2008-01-15^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2009-10-05^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20090104105-A |
| titleOfInvention |
High Density Refractory Metal and Alloy Sputtering Target |
| abstract |
The present invention relates to a fabrication process of high density refractory metal products through a press / sinter process. The present invention also relates to a manufacturing process of a sputtering target and a sputtering target manufactured according to this process. |
| priorityDate |
2007-01-16^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |