http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100025488-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2009-08-26^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1b71d0b212b8a18ab126f3c3f2034a5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a5e27cb33dcee3594a1877478857e98 |
| publicationDate | 2010-03-09^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20100025488-A |
| titleOfInvention | Positive resist composition and method of forming resist pattern |
| abstract | The present invention provides a positive resist composition and a resist pattern forming method capable of forming a high resolution resist pattern.n n n The composition is a positive resist composition containing a resin component (A) in which solubility in an alkaline developer is increased by the action of an acid, and an acid generator component (B) which generates an acid by exposure, wherein the resin component ( A) represents General formula (1) [In formula, P represents a valent organic group, a represents the integer of 2-20, Y represents an arylene group or the C1-C12 alkylene group, X is an acid A specific bond group that can be dissociated by the action of.] And a polymer having a core portion shown in the above and an arm portion composed of a polymer chain bonded to the core portion and obtained by an anion polymerization method.n n n [Formula 1] |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110137742-A |
| priorityDate | 2008-08-27^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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