http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100039229-A

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publicationDate 2010-04-15^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100039229-A
titleOfInvention Positive resist composition and method of forming resist pattern
abstract Base material component (A) containing the high molecular compound (A1) which has a structural unit (a1) derived from the structural unit (a0) represented by general formula (a0-1), and the acrylate ester containing an acid dissociable, dissolution inhibiting group, and general Positive type resist composition containing acid generator component (B) containing acid generator (B1) which has an anion part represented by Formula (I); In formula (a0-1), R < 1> is a hydrogen atom, a C1-C5 lower alkyl group, or a C1-C5 halogenated lower alkyl group, R < 2> is a bivalent coupling group, R < 3> represents -SO < 2> -in a ring skeleton. It is a cyclic group containing. In formula (I), X is a C3-C30 cyclic group, Q < 1> is a bivalent coupling group containing an oxygen atom, Y < 1> is a C1-C4 alkylene group or fluorinated alkylene group.n n n [Formula 1]
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140047045-A
priorityDate 2008-10-07^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23088900
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