http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100047849-A

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classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66772
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-045
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12
filingDate 2008-06-18^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90a374176e49b6949d98fca23538a820
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a953d20a16a0e03217c79b4ae7b92a42
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publicationDate 2010-05-10^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100047849-A
titleOfInvention Method for manufacturing semiconductor device
abstract This invention provides the manufacturing method of the semiconductor device by which the space | interval between the semiconductor films which are transposed to several places is suppressed. Translocation of the semiconductor film from the bond substrate to the base substrate is performed a plurality of times. In the case where the semiconductor film to be transferred first and the semiconductor film to be transferred later are adjacent to each other, the subsequent transfer is performed by using a bond substrate with an end portion partially removed. The bond substrate used for the subsequent transposition is assumed to be larger than the film thickness of the semiconductor film whose width in the direction perpendicular to the bond substrate in the region where the end portion is removed is first displaced.
priorityDate 2007-06-28^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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