| abstract |
In the present invention, alkali solubility is changed by the action of an acid, and in general formula (c1-1) [In formula (c1-1), R is a hydrogen atom, a lower alkyl group, a halogen atom, or a halogenated lower alkyl group; R f is a fluorinated alkyl group; Y 0 is an alkylene group] containing a base component (A) not having a structural unit (c1), an acid generator component (B) which generates an acid upon exposure, and the structural unit (c1). It is a immersion exposure resist composition containing a fluororesin component (C). |