| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2009-12-30^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a1b0bd0580d167cf31a8294373833ae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4edab0e9a0ce2e838e614dbe691f285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd9538d14b2240045123fb720268dc7b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc9038bbaefc4aff2ab911b0dda66757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fb99758c98ee8b0a4f908e5d08022e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e3cdbba8a261e12da28881039f03d00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2522a3ee0ab310ad09d07fb550afef1c |
| publicationDate |
2011-07-07^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110077683-A |
| titleOfInvention |
Composition for resist underlayer film and method for manufacturing semiconductor integrated circuit device using same |
| abstract |
In the present invention, there is provided a composition for a resist underlayer film comprising an organosilane-based condensation polymer containing 10 to 40 mol% of structural units represented by the following formula (1) and a solvent.n n n [Formula 1]n n n n n n n n The definition of ORG in Chemical Formula 1 is as described in the specification.n n n As a result, the present invention can provide a resist underlayer film composition capable of transferring an excellent pattern by providing a resist underlayer film having excellent storage stability and resistance to etching and a method of manufacturing a semiconductor integrated circuit device using the same.n n n n Resist underlayer, organosilane condensation polymer, storage stability, etch resistance |
| priorityDate |
2009-12-30^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |