| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2010-03-12^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a06b5930866f7ec900219c3bfe2cb872
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6af8dd7c0cc87e9165369a4681065f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b2cbaa9fef0bd8ec66e14cb425cfb01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5f062567583e1ff4197aee7ca9cc5a5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c176f1fdce4113014561a5a266f36da |
| publicationDate |
2011-12-22^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20110137306-A |
| titleOfInvention |
Actinic-ray-sensitive or radiation-sensitive resin composition and pattern formation method using the composition |
| abstract |
The actinic ray-sensitive or radiation-sensitive resin composition according to one embodiment of the present invention is: (A) any one of the compounds of the following general formula (I); And (B) Resin containing the residue (c) of the compound whose ionization potential value is lower than phenol and shows the solubility which increased in the alkaline developing solution by the action of an acid. [From here, Ar represents an aromatic ring having a Cy group and optionally another substituent, n is an integer of 2 or more, Cy represents a group having a substituted or unsubstituted alkyl group or a group having a substituted or unsubstituted alicyclic group, provided that a plurality of Cy groups may be the same as or different from each other, M + represents an organic onium ion] |
| priorityDate |
2009-03-13^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |