| abstract |
The method for manufacturing a glass substrate provided according to the present invention etches the surface of the glass substrate with hydrofluoric acid (HF) or a fluoride substitute etchant comprising an alkaline solution, thereby having nano-sized pores on the surface of the glass substrate. Forming a layer of porous structure. Unlike the prior art, it is possible to provide a glass substrate having no antireflection properties, antifogging properties, and superhydrophilic properties through a simple process at a relatively low temperature without forming a separate coating layer, using no harmful chemicals. Such a glass substrate can be efficiently applied to various applications requiring high light transmittance, such as a protective filter for a display device, a solar cell, a mobile communication terminal, a building glass, a lens for an optical element. |