| abstract |
A resist composition, a method of forming a resist pattern using the resist composition, a novel high molecular compound, and a compound useful as a monomer of the high molecular compound are provided. As a resist composition containing the base component (A) which changes the solubility to a developing solution by the action of an acid, and the acid generator component (B) which generate | occur | produces an acid by exposure, the said base component (A) is a general Resist composition containing resin component (A0) which has structural unit (a0) represented by Formula (a0) [In formula, A is a bivalent coupling group, R < 1> may be a hydrogen atom or a C1-C6 which may have a substituent. Hydrocarbon group; [Formula 1] |