http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120129828-A

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-618
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-618
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filingDate 2012-05-18^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2012-11-28^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20120129828-A
titleOfInvention Method for producing compound, resin, photoresist composition and photoresist pattern
abstract The present invention relates to compounds of formula (I): Formula I In the above formula (I) T 1 is a single bond or a C6-C14 aromatic hydrocarbon group, L 1 is a C1-C17 divalent saturated hydrocarbon group, wherein the methylene group can be replaced with an oxygen atom or a carbonyl group, L 2 and L 3 are each independently a single bond or a C1-C6 divalent saturated hydrocarbon group, wherein the methylene group can be replaced with an oxygen atom or a carbonyl group, Ring W 1 and ring W 2 are each independently a C3-C36 hydrocarbon ring, R 1 and R 2 are each independently a hydrogen atom, a hydroxyl group or a C1-C6 alkyl group, R 3 and R 4 are each independently a hydroxyl group or a C1-C6 alkyl group, R 5 is a hydroxyl group or a methyl group, m is 0 or 1, t and u are each independently an integer of 0-2.
priorityDate 2011-05-20^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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