http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20120137261-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2012-06-07^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e04511b6ef753a717725f9debdfc548 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6068319f9279ed74d41db69dc719c517 |
| publicationDate | 2012-12-20^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20120137261-A |
| titleOfInvention | Method of forming resist pattern |
| abstract | Process of forming a resist film on a support body using the resist composition containing the base material component (A) which the solubility with respect to the organic solvent reduces by the action of an acid, and the acid generator component (B) which generate | occur | produces an acid by exposure. Exposing the resist film; patterning the resist film by negative development using a developer containing the organic solvent; forming a resist pattern; applying a coating forming agent onto the resist pattern to form a coating film And a step of performing heat treatment at a temperature lower than the softening point of the resist pattern to thermally shrink the coating film to narrow the gap between the resist patterns, and removing the coating film. |
| priorityDate | 2011-06-10^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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