| abstract |
(assignment) Provided are an actinic ray-sensitive or radiation-sensitive resin composition which makes it possible to achieve high sensitivity, good pattern shape, good roughness characteristics, and good roughness characteristics, and an actinic ray-sensitive or radiation-sensitive resin film and pattern forming method using the same. do. (Solution) A repeating unit (A) containing a group that is decomposed by actinic radiation or radiation to generate an acid, and a repeating unit (B) containing a group that is decomposed by the action of an acid and solubility in an alkaline developer is increased. An actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) and a compound (Q) represented by the following general formula (1), wherein each symbol in the general formula (1) Meaning. |