| abstract |
The negative photosensitive resin composition containing (A) alkali-soluble resin whose carboxylic acid equivalent is 200 g / mol or more and 1,400 g / mol or less, (B) photoinitiator, (C) polyfunctional monomer, and (D) zirconium compound. It is possible to provide an alkali developable negative photosensitive resin composition which is excellent in pattern workability, and gives a cured film having high hardness and high transparency by UV curing and thermosetting and excellent moisture heat resistance. |