| abstract |
The present invention provides a method for forming a laminated film and an apparatus for forming the same, which can suppress the occurrence of cracks. In the method of forming a laminated film according to an embodiment of the present invention, a silicon oxide film forming step of forming a silicon oxide film on a plurality of workpieces contained in the reaction chamber, and supplying a silicon source, a nitriding agent, and an oxidizing agent to the reaction chamber, And a silicon oxynitride film forming step of forming a silicon oxynitride film on the plurality of workpieces, and repeating the silicon oxide film forming step and the silicon oxynitride film forming step, wherein the silicon oxide film and the And forming a laminated film of the silicon oxynitride film. |