| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_70191c98719c658f3f5203fad1731395 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1608 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76822
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76813
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0475 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2012-08-16^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3f08af1cb575183cd6a905b5411deab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0bea09df0333815402f343748a5ecb17 |
| publicationDate |
2014-06-05^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140068036-A |
| titleOfInvention |
Plasma etching method |
| abstract |
SUMMARY OF THE INVENTION The present invention provides a plasma etching method capable of forming tapered concave portions in a wide-gap semiconductor substrate. As a means for solving the problem, a high-speed corneal film E having a higher etching rate than the wide-gap semiconductor substrate K is formed on the surface of the wide-gap semiconductor substrate K and a mask M having an opening is formed thereon. After the wide-gap semiconductor substrate K on which the high-speed cornea E and the mask M are formed is mounted on a die and the wide-gap semiconductor substrate K is heated to 200 ° C or higher, At the same time as the gas is converted into plasma, a bias potential is applied to the die to etch the wide-gap semiconductor substrate K. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9934972-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102197611-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022220576-A1 |
| priorityDate |
2011-09-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |