| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2012-10-25^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfe58e5ebbbfe04cb962e57902f7c4e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bda610e3d51ab514daf7538f668089e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa485c7f56d146cd9f855a87b1388ab7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_962132911cf911e4cb5af4b286a88959 |
| publicationDate |
2014-08-06^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140097202-A |
| titleOfInvention |
Pattern-forming method |
| abstract |
The present invention relates to a pattern forming method that can be applied to the reduction of the line width of a resist pattern used in lithography. The pattern formation method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition comprises an acid generator, and a first polymer comprising an acid-dissociable group. The resist film is exposed. A resist film is developed using a developer having an organic solvent content of 80 mass% or more to form a preliminary pattern of the resist film. A composition comprising a plurality of second polymers is used to form a polymer film having a phase separation structure in the space defined by the preliminary pattern. Part of the phase separation structure of the polymer film is removed. |
| priorityDate |
2011-10-28^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |