| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cebc9740ef706cde29e885504f274ffa |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F24-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2013-03-05^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99acb4b074094251f50ea6452c55f441
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea1339f90632dfffa033baea49f13782
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d41f0e095482f13a225217d9883d46e5 |
| publicationDate |
2014-09-15^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140109466-A |
| titleOfInvention |
Copolymer for lithography and method for manufacturing same, resist composition, and method for manufacturing substrate |
| abstract |
The present invention relates to a method for producing a copolymer which comprises a monomer unit containing an acid labile group and a monomer unit containing no acid labile group and having an elution curve showing a peak relating to the copolymer in an elution curve obtained by GPC, The ratio of the monomer units containing acid labile groups in the copolymer contained in each of the fractions from the first to the fourth eluted first out of the five divided fractions is N (v 1 ) to N (v 4) ) in mol%, when the ratio of the monomer unit containing the acid elimination group in the copolymer contained in the total of illustration five fraction by N ave mole%, N (v 1) / N ave is 1.01 to 1.09 , And N (v 2 ) / N ave , N (v 3 ) / N ave , and N (v 4 ) / N ave are both 0.95 to 1.05. |
| priorityDate |
2012-03-05^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |