http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140112563-A

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filingDate 2013-03-01^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc858c749c9ec03da2eaecd53626e43b
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publicationDate 2014-09-23^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20140112563-A
titleOfInvention Manufacturing method of semiconductor device
abstract A method for manufacturing a semiconductor device having a processing member, the method comprising the steps of: performing pattern exposure on an adhesive layer of an adhesive support having a substrate and an adhesive layer capable of increasing or decreasing adhesiveness by irradiation with an actinic ray or radiation, Bonding the first surface of the member to be treated to the adhesive layer of the adhesive support, and forming a second adhesive layer on the second surface different from the first surface of the member to be treated A step of applying a mechanical or chemical treatment to the treatment member to obtain a treatment member, and a step of separating the first side of the treatment member from the adhesive layer of the adhesive support.
priorityDate 2012-03-02^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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