http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140144291-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d3082cd39bb800686b9abbb8aa05c80b
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04
filingDate 2013-04-04^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37a643085ec669c74ed2c5f562d2112e
publicationDate 2014-12-18^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20140144291-A
titleOfInvention Polishing pad with light-stable light-transmitting region
abstract The present invention provides a polishing pad comprising at least one light-transmitting region and optionally a polishing pad body. Wherein said light-transmitting region comprises a material comprising (a) a polymeric resin and (b) at least one light-absorbing compound, said light-transmitting region having a light transmittance of at least 25% at one or more wavelengths in the range of 250 nm to 395 nm Total light transmittance.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019031788-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210021056-A
priorityDate 2012-04-11^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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