http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150029827-A

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-26
filingDate 2013-09-10^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69aff41de55b50281a0df475b312afa7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76e18c4f64dd0775ff0c2b3f723a1c57
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f390ba9e0592666097d96d746aa1711b
publicationDate 2015-03-19^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20150029827-A
titleOfInvention ETCHANT COMPOSITION FOR NICKEL-BASED METAL LAYER AND TiN
abstract The present invention relates to a composition comprising, based on the total weight of the composition, a) 5 to 60% by weight of at least one component selected from the group consisting of nitric and sulfonic acids, b) 0.1 to 40% by weight of hydrogen peroxide, and c) A nickel-based metal film and a TiN etching composition.
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priorityDate 2013-09-10^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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