| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b55c349b43c3ecba4977fd52cc8f8c67 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24942
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2255-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2255-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2457-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2264-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2307-418 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G09F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-113 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11 |
| filingDate |
2014-01-27^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_929e8fe6b2265b5d56fbed809ef8c2c6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecbf15d61c2692c2feb100a1e463ada5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2bfc2a684cbce89d6f939e4f7b836d4e |
| publicationDate |
2015-10-07^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20150112966-A |
| titleOfInvention |
Anti-reflection film and production method therefor |
| abstract |
An antireflection film having excellent reflection characteristics (low reflectivity) in a wide band and also having no coloration against the reflection color of incident light from the oblique direction as well as the front direction is provided. The antireflection film of the present invention has a substrate and a medium refractive index layer, a high refractive index layer and a low refractive index layer in this order from the substrate side. In the present invention, when the optical design of the reflection characteristic of the antireflection film is carried out using the complex plane of the amplitude reflectivity at a wavelength of 580 nm, a line segment connecting the point A and the end point B of the lamination locus of the high- The refractive index and / or the thickness of the substrate, the medium refractive index layer, the high refractive index layer and the low refractive index layer are designed so that AB crosses the real axis of the amplitude reflectivity. |
| priorityDate |
2013-01-29^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |