http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150121194-A

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publicationDate 2015-10-28^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20150121194-A
titleOfInvention Variable radius dual magnetron
abstract A dual magnetron that is particularly useful for RF plasma sputtering includes opposing magnetic poles 90 and 92 and a radially fixed open loop that rotates about a central axis 14 to scan the outer region of the sputter target 20 Includes a magnetron 82 and opposed magnetic poles 96 and 98 and a radially movable open loop magnetron 84 that rotates with the stationary magnetron. During processing (FIG. 2), the movable magnetron is positioned radially in an outer region having an open end abutting the open end of the stationary magnetron to form a single open loop. During cleaning (FIG. 3), a portion of the moving magnetron is moved radially inward to scan and clean the inner region of the target that was not scanned by the fixed magnetron. The movable magnetron 114 pivots about the axis 118 at the periphery of the rotating disc-shaped plate 100 equipped with the fixed magnetron to move the arm centrally between radial positions depending on the rotational speed or direction It can be mounted on the arm.
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