http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150138954-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_799858790a0d932d2bf525d1f2324ad6 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32238 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32229 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
| filingDate | 2014-05-30^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d07f4003ae6fb310ccd3a10ca540483f |
| publicationDate | 2015-12-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20150138954-A |
| titleOfInvention | Dielectric plate and substrate processing apparatus using the same |
| abstract | The present invention provides a substrate processing apparatus. The substrate processing apparatus includes a process chamber, a substrate supporting unit, an antenna, a chopper plate, a dielectric plate, and the like. Plating the metal layer on which the slots are formed in the dielectric plate rather than the antenna improves the adhesion between the antenna and the dielectric plate. Therefore, the uniformity of the electric field of the microwave is increased, the efficiency of plasma generation is increased, and arcing between the antenna and the dielectric plate is prevented, so that the life of the antenna, the wave plate and the dielectric plate can be prolonged. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180109291-A |
| priorityDate | 2014-05-30^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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