http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160052609-A

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filingDate 2014-08-18^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2016-05-12^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20160052609-A
titleOfInvention Wafer dicing method for improving die packaging quality
abstract In embodiments, a hybrid wafer or substrate dicing process involving an initial laser scribe and subsequent plasma etch is implemented to also remove the oxide layer from the metal bumps on the wafer while dicing. In one embodiment, a method includes forming a mask covering a plurality of ICs on a semiconductor wafer, wherein the plurality of ICs include metal bumps or pads having an oxide layer. The method includes patterning the mask using a laser scribing process to provide a patterned mask having gaps exposing regions of the semiconductor wafer between the ICs. The method includes plasma etching the semiconductor wafer through gaps in the patterned mask to singulate a plurality of ICs and remove the oxide layer from the metal bumps or pads.
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