patent/KR-20170013326-A

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170013326-A

Outgoing Links

Predicate	Object
assignee	http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_069a92549123806a5d654dc036a676e9
classificationCPCAdditional	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02C20-30
classificationCPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F04B41-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F04B37-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F04B37-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67276 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32844 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
classificationIPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F04B37-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
filingDate	2015-05-28^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8cdc35b88ab316cf5e5c6f98291c655e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a29956795b6b800e61f97cc13b888d29 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_452e37d5bf066c1777edda6735714051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3511c19cb3c3d19250232302bccbf3c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c501f303568482238ae3f0574fa8cbc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11fd85deba98bdbab950787df5dd26b3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd6810138bf088f57c57cde65d42939d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9eb6af1e5b46d575dd12f9825b66c845
publicationDate	2017-02-06^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	KR-20170013326-A
titleOfInvention	Vacuum evacuation system
abstract	The present invention relates to a vacuum exhaust system used for exhausting a process gas from one or a plurality of process chambers used in a semiconductor device manufacturing apparatus or the like. The vacuum exhaust system is a vacuum apparatus for evacuating gas from a plurality of process chambers 1. The vacuum exhaust system includes a plurality of first vacuum pumps 5 connected to a plurality of processing chambers 1, a collecting tube 7 connected to a plurality of first vacuum pumps 5, And a second vacuum pump 8 connected thereto.
isCitedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101971827-B1
priorityDate	2014-05-30^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate	Subject
isCitedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005232977-A
isDiscussedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456978213

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