http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170068779-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8107c1d3b208943503b1582589c00cd2
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32733
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
filingDate 2015-12-10^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be5d14b556c72e7a090ac107b04caf95
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2fc43f8632bc604600e468cd3cdbc291
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14060c48e005a85cff4755bf442cbbb0
publicationDate 2017-06-20^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20170068779-A
titleOfInvention Plasma process apparatus
abstract The present invention relates to a plasma processing apparatus, and more particularly, to a plasma processing apparatus, and more particularly, to a plasma processing apparatus having a plurality of capacitive coupling electrodes for discharging a capacitively coupled plasma linearly arranged in two rows in a horizontal direction on an upper portion of a chamber, the present invention relates to a plasma processing apparatus capable of expanding more than a scale and capable of high-density thin film deposition with excellent process stability.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11218938-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220021120-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11019548-B2
priorityDate 2015-12-10^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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