http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180024412-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b45ad6805b4a5d8fb2ac598236744903 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1820ca0ef1296b97f0479596e00a0a15 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3407 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-541 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-562 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-345 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 |
| filingDate | 2016-08-30^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f5c9697ef6317078c44c667729dfc33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1744032315499c25ad2ee9a48e7fe1ab http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce0d0717a5a20dfbe5234d5e43e3b5ac |
| publicationDate | 2018-03-08^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20180024412-A |
| titleOfInvention | method for sputtering using roll to roll deposition system |
| abstract | A sputtering method using a roll-to-roll deposition apparatus is disclosed. In one embodiment, the sputtering method using the roll-to-roll deposition apparatus includes a substrate placement process, a tension application process, and a plasma generation process. In the substrate disposing process, the flexible substrate and the target are opposed to each other in the sputtering chamber through an unwinding roller and a winding roller disposed opposite to each other. In the applying of the tension, tension is applied to the substrate facing the target so that the substrate maintains a predetermined distance from the target. In the plasma generation process, a sputtering gas is injected into the chamber, and a voltage is applied between the substrate and the target through a power source to generate plasma in the chamber. The target is disposed on one side of the substrate, and a film is deposited on one side of the substrate by sputtering with the plasma. The substrate disposing process includes a substrate supplying process for supplying the substrate to the chamber by rolling the unwinding roller, and a substrate recovering process for recovering the substrate by rolling the winding roller. Wherein the tension application process includes a roller contact process for bringing the first roller and the second roller, which are spaced apart from each other between the unwinding roller and the winding roller, into contact with the other surface of the substrate, rolling the first roller A first substrate transferring step of supplying the substrate from the unwinding roller to the second roller, and a second substrate transferring step of supplying the substrate supplied from the first roller to the winding roller by rolling the second roller, And a substrate transfer process. In this case, a tension is applied to the substrate portion-hereinafter referred to as a deposition region, located between the first roller and the second roller in the substrate through the rolling of the first roller and the second roller, So as to maintain the predetermined distance from the target. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112522678-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112522678-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115354291-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115354291-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020176942-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113544306-A |
| priorityDate | 2016-08-30^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID1969 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635 |
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