http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180096086-A

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filingDate 2017-02-20^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e77860b321ffb7a86d77709cd3b75a81
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publicationDate 2018-08-29^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20180096086-A
titleOfInvention Method for analysing character of negative capacitance semiconductor device and electric circuit simulating method
abstract A method for analyzing characteristics of a negative capacitance semiconductor device including a semiconductor element and a ferroelectric negative capacitor connected to the semiconductor element and having a negative capacitance, includes the steps of: determining a gate-source voltage (V GS) applied to the ferroelectric negative capacitor A second step of calculating an internal voltage of the ferroelectric negative capacitor based on the gate-source voltage and the property information, a second step of calculating an internal voltage of the ferroelectric negative capacitor based on the gate-source voltage and the property information, A third step of calculating a channel surface voltage of the ferroelectric negative capacitor based on the information and the internal voltage, and a third step of calculating a drain current I D according to a gate-source voltage applied to the ferroelectric negative capacitor based on the channel surface voltage Calculating And a fourth step.
priorityDate 2017-02-20^^<http://www.w3.org/2001/XMLSchema#date>
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