| abstract |
Tungsten precursor and a method for forming a tungsten-containing film using the same. This tungsten precursor is represented by the following formula (1). [Chemical Formula 1] Wherein R 1 , R 2 and R 3 each independently represent a substituted or unsubstituted linear or branched alkyl group having 1 to 5 carbon atoms, R 4 and R 5 each independently represents a linear or branched A branched alkyl group, a halogen atom, a dialkylamino group of C2 to C10 or a trialkylsilyl group of C3 to C12, n is 1 or 2, and m is 0 or 1. When n is 1, m is 1. when n is 2, m is 0, R 1 and R 2 are each 2, and two R 1 s are independent of each other, and two R 2 s are independent of each other. |