http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200000483-A

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filingDate 2013-07-29^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6e1d3020610bd37661e2a9a4ca35b96
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publicationDate 2020-01-02^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20200000483-A
titleOfInvention Photocathode including silicon substrate with boron layer
abstract A photocathode is formed on a single crystalline silicon substrate having opposing illumination (top) surfaces and an output (bottom) surface. To prevent the oxidation of silicon, a thin (eg 1-5 nm) boron layer is placed directly above the output surface using a process that minimizes oxidation and defects, and then lower work on the boron layer to enhance the emission of photoelectrons. A hydrous material layer is formed. Low work function materials include alkali metals (eg cesium) or alkali metal oxides. An optional second boron layer is formed on the illumination (top) surface, and an optional antireflective material layer is formed on the boron layer to enhance the entry of photons into the silicon substrate. An optional external potential is generated between the opposing illumination (top) surface and the output (bottom) surface. Photoelectric cathodes form part of the novel sensor and inspection system.
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