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publicationDate 2020-11-09^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20200126903-A
titleOfInvention Resist underlayer compositions and methods of forming patterns with such compositions
abstract A resist underlayer composition comprising a polyarylene ether, an additive polymer different from the polyarylene ether, and a solvent, wherein the additive polymer is at least one protective selected from hydroxy, thiol, and amino And aromatic or heteroaromatic groups having free or free functional groups.
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