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publicationDate 2021-02-10^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20210015676-A
titleOfInvention Positive resist composition and patterning process
abstract A repeating unit having an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group (a), and a repeating unit having a carboxyl group substituted with an acid labile group (b1) and/or a repeating unit having a phenolic hydroxy group substituted with an acid labile group The positive resist material containing the base polymer containing (b2) has high sensitivity and resolution, has a small edge roughness, and forms a pattern of good shape with improved dimensional uniformity.
priorityDate 2019-08-02^^<http://www.w3.org/2001/XMLSchema#date>
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