http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210132206-A

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filingDate 2010-08-30^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-11-03^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20210132206-A
titleOfInvention Oxide semiconductor film and semiconductor device
abstract SUMMARY OF THE INVENTION It is an object of the present invention to provide a highly reliable semiconductor device having good electrical characteristics, and a display device including the semiconductor device as a switching element. In a transistor including an oxide semiconductor layer, a needle crystal group provided on at least one surface side of the oxide semiconductor layer grows in a c-axis direction perpendicular to the surface and forms an ab plane parallel to the surface. Including and excluding the needle-shaped crystal group, the region is an amorphous region or a region in which amorphous and microcrystals are mixed. Accordingly, a highly reliable semiconductor device having good electrical properties can be formed.
priorityDate 2009-09-24^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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