| abstract |
The present invention relates to a valve coupler (20) and gas treatment components for ultra-high purity gas distribution used in semiconductor manufacturing. In the coupler, a valve stem / bullnose 34 seals the opening of the coupler 56 immediately adjacent the outside of the coupler so that only the minimal submerged surface of the coupler is exposed to the outside. The gas treatment component (eg, filter 120), or the integral gas stick assembly 12, may be sealed from the outside at the inlet and outlet by the valve coupler. As a result, the entire device is cleaned after it has been manufactured and the need for cleaning after installation is maintained in a controlled environment during shipping and installation. |