| abstract |
AMMONIA-FREE, HF-FREE CLEANING COMPOSITIONS FOR CLEANING PHOTORESIST AND PLASMAASH RESIDUES FROM MICROELECTRONIC SUBSTRATES, AND PARTICULARLY TO SUCH CLEANING COMPOSITION USEFUL WITH AND HAVING IMPROVED COMPATIBILITY WITH MICROELECTRONIC SUBSTRATES CHARACTERIZED BY SENSITIVE POROUS AND LOW-K OT HIGH-K DIELECTRICS AND COPPER METALLIZATION. THE CLEANING COMPOSITION CONTAIN ONE OR MORE NON-AMMONIUM PROSUCING, NON-HF PRODUCING FLUORIDE SALT (NON AMMONIUM, QUATERNARLY AMMONIUM FLUORIDE SALT) IN A SUITABLE SOLVENT MATRIX. |