| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_069a92549123806a5d654dc036a676e9 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76864 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76874
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1628
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76849
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-288 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D17-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
2002-11-06^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0ade2f0e80468930c63f8c23cd6504c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d48e7869bb6a46df1977c761d40ed37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a878d6e9a48e9250e6bfd2030545c148 |
| publicationDate |
2003-05-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200300179-A |
| titleOfInvention |
Substrate processing apparatus and method |
| abstract |
There is provided a substrate processing apparatus and method which employs the socalled batch processing method of processing a plurality of substrates simultaneously, thereby increasing the throughput, and which can carry out processing, such as electroless plating, stably and securely with a relatively simple apparatus. The substrate processing apparatus includes: a processing bath for holding a processing liquid: and a substrate holder which is vertically movable relative to the processing bath and which includes a plurality of substrate holding portions for holding a plurality of substrates in parallel: wherein each substrate holding portion has a substrate stage and a substrate presser, which can move close to or away from each other and can grip therebetween a peripheral portion of a substrate to thereby hold the substrate with its back surface sealed, and has a heating medium flow passage for passing a heating medium therethrough so as to regulate the temperature of the substrate holding portion. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I385276-B |
| priorityDate |
2001-11-07^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |